ald장비/ald진공장비/ald_GEMSTAR-8™ Benchtop ALD_ARRADIANCE_나노큐

ald장비/ald진공장비/ald_GEMSTAR-8™ Benchtop ALD_ARRADIANCE_나노큐

Continuing trends in technology-driven industries are driving towards increased performance, miniaturization, lower power consumption, lower production costs, and an environmentally friendly production environment.

Founded in 2003, Arradiance combines unique talents in material science, charged particle physics, equipment design, modeling and simulation, vacuum technology, and metrology.

With a concentration in charged particle detection and amplification, Arradiance is the first to develop and demonstrate the capability of producing high gain, low noise micro channel amplifiers. Using our proprietary Atomic Layer Deposition (ALD) materials and equipment, Arradiance offers a new approach to electron amplification devices replacing the legacy traditional lead-glass/hydrogen firing process developed in 1960’s currently used for all state-of-the-art MCP applications.

With adoption in the near future of Arradiance process technologies, coupled with the recent advancements in vacuum MEMS technology, it is now foreseeable that high gain, low noise, low power semi-conductor process devices can be produced with far greater performance than traditional avalanche diode technologies.

GEMSTAR-8™ Benchtop ALD

GEMSTARTM Meeting the challenge of high aspect ratio deposition over a broad range of substrates in a small package 

 

Economical systems engineered for heavyweight tasks and lightweight budgets 

 

GEMSTARTM Benchtop ALD 

The product line deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. They are designed for uniform conformal growth of films from precursors that have a CVD growth component. 

 

The uniformity of thin films can determine whether a process or device works, the system is designed to provide the user with the most uniform films possible even in challenging HAR through-hole applications. 

 

Some key features of the system include: 

 -  Up to 200mm Ø substrates and 3D objects 25mm tall. Customizable end effector allows clean, simple and repeatable loading of substrates 

 -  Up to 300⁰C dual zone ALD process reactor with substrate thermal control to ± 1°C 

 -  8 ALD precursor ports with up to four external ALD oxidizer gases (2 Standard) 

 -  Single Inert gas vapor pressure assist for ultra-low vapor pressure precursors. 

 -  Up to 150⁰C dual zone gas manifolds with distributed gas reactor input insures uniform gas distribution over the entire substrate 

 -  Up to 140⁰C dual zone ALD insulated bottle jackets 

 -  Metal seal gas handling with dual differentially pumped o-ring door seals ensures minimal process contamination at high temperatures 

 -  System pressure monitoring 

 -  MFC controlled user selectable purge gas input 

 -  CF 2.75 flange reactor interface for easy attachment of optional QCM or mass spectrometer 

GEMFlowTM Process Control 

Precise films require state-of-the-art controls. Our system maintains control over key parameters such as exposure, purge, background pressure and temperature at all zones. 

 User created/saved process recipes allows substrate to substrate and batch to batch consistency without sacrificing flexibility 

 Diagnostic system logging allows creation of traceable data of all system parameters during all process runs 

 Dell Vostro 3700 Laptop with Genuine Windows® 7 Professional 64-Bit 

 Internal GEMStar USB control module 

Easy Maintenance 

Simplified tool maintenance results from the use of a modular system design with benchtop access to all critical components 

 Critical system components can be removed allowing for cleaning of unwanted contaminants with little down time. 

 Rear access to vacuum, power and gas line connections 

 Small system footprint and light weight allows benchtop placement in any lab environment

GEMSTAR-8™ Benchtop ALD

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ald장비/ald진공장비/ald_GEMSTAR-8™ Benchtop ALD_ARRADIANCE_나노큐